Chemical dissolution of gallium antimonide in the HNO 3 -HCl-CH 3 COOH solutions

Autor:	Z. F. Tomashik, V. I. Grytsiv, V. M. Kashpor, O. S. Chernyuk, V. N. Tomashik
Rok vydání:	2003
Předmět:	Materials science Inorganic chemistry chemistry.chemical_element Mineralogy Polishing Isotropic etching Gallium antimonide chemistry.chemical_compound chemistry Antimony Etching (microfabrication) Gallium Dissolution Surface finishing
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
DOI:	10.1117/12.502294
Popis:	The nature of GaSb dissolution in the mixtures of HNO3-HCl-CH3COOH system in reproducible hydrodynamics conditions has been investigated. The main regularities of chemical etching and polishing of GaSb, Sb and Ga were determined and surfaces of equal etching rates (Gibbs diagrams) were built. The potentials of self-dissolutions of indicated materials in the investigated solutions were studied also. Region of polishing solutions was defined and etchant compositions for chemical dynamic polishing of GaSb were optimized.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::4dba07127571d1d265975757f3861686 https://doi.org/10.1117/12.502294 Zobrazit plný text záznamu