Critical Thickness of Heteroepitaxial Si1-xGex/Si Layers as Studied by Atomic Force Microscopy

Autor:	Toshiyuki Nakamura, Kinya Ashikaga, Morifumi Ohno, Seigo Ohno
Rok vydání:	1992
Předmět:	Materials science Atomic force microscopy Nanotechnology Critical thickness
Zdroj:	Extended Abstracts of the 1992 International Conference on Solid State Devices and Materials.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::4d9f5fedf8a8f4f24015686340c9c2aa https://doi.org/10.7567/ssdm.1992.s-ii-3 Zobrazit plný text záznamu