Novel, convenient, low cost alternative method for film fabrication: Titanium nitride thin films on alumina substrates for automotive applications from a molecular precursor, (CH3)3SiNHTiCl3

Autor:	Pawel Czubarow, Dietmar Seyferth, Chaitanya K. Narula
Rok vydání:	1995
Předmět:	Alternative methods Materials science Fabrication business.industry Process Chemistry and Technology Automotive industry Nanotechnology Surfaces and Interfaces General Chemistry Molecular precursor Titanium nitride chemistry.chemical_compound chemistry Physical vapor deposition Thin film business
Zdroj:	Chemical Vapor Deposition. 1:51-53
ISSN:	1521-3862 0948-1907
DOI:	10.1002/cvde.19950010204
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::4d50e7f045c9ded231c40bc6daed03b9 https://doi.org/10.1002/cvde.19950010204 Zobrazit plný text záznamu Plný text