Study of the diffusion at the Gd/Cu interface
| Autor: | D. Raiser, J.C. Sens |
|---|---|
| Rok vydání: | 1992 |
| Předmět: |
Lanthanide
Annealing (metallurgy) Chemistry Gadolinium Analytical chemistry General Physics and Astronomy chemistry.chemical_element Surfaces and Interfaces General Chemistry Condensed Matter Physics Copper Surfaces Coatings and Films Metal X-ray photoelectron spectroscopy Transition metal visual_art visual_art.visual_art_medium |
| Zdroj: | Applied Surface Science. 55:277-286 |
| ISSN: | 0169-4332 |
| Popis: | The Gd/metal interface has been studied using AES, XPS and RBS methods to obtain depth profiles. The present report deals with the interfaces of thin Gd films on Cu. Some physical information is deduced: evolution of the interface as a function of annealing time and temperature, and determination of the diffusion coefficients of Gd in Cu. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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