Shadow Nanosphere Lithography: Simulation and Experiment
Autor: | Krzysztof Kempa, Michael Giersig, A. Kosiorek, Piotr Chudzinski, Witold Kandulski |
---|---|
Rok vydání: | 2004 |
Předmět: |
Materials science
genetic structures business.industry Scanning electron microscope Mechanical Engineering Nanowire Bioengineering General Chemistry Condensed Matter Physics Electron beam physical vapor deposition Rod Nanolithography Monolayer Optoelectronics Nanosphere lithography General Materials Science Self-assembly business |
Zdroj: | Nano Letters. 4:1359-1363 |
ISSN: | 1530-6992 1530-6984 |
Popis: | In this letter we describe the preparation of large-area, two-dimensional metallic structures using shadow nanosphere lithography. By varying the position of the substrate with respect to the evaporation source during the sample preparation, we make morphologies such as cups, rods, and wires, that are not accessible by the standard nanosphere lithography. This technique also allows for an encapsulation of the metallic structures, to prevent them from oxidation. Morphologies predicted by our computer simulations have been subsequently confirmed experimentally. |
Databáze: | OpenAIRE |
Externí odkaz: |