Unveiled Understanding on Thermodynamic Mechanisms of Atomic Layer Deposition Based on Trimethylaluminum and Water Precursors
| Autor: | Da-Som Shin, Ki Chul Kim, Jae Won Choi, So-Yeon Ham, Yo-Sep Min, Suhyun Lee |
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| Rok vydání: | 2020 |
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| Zdroj: | Industrial & Engineering Chemistry Research. 59:13325-13332 |
| ISSN: | 1520-5045 0888-5885 |
| Popis: | Despite the importance of the atomic layer deposition (ALD) technique for developing thin films of various inorganic materials with the precisely controlled thickness, the detailed mechanistic path... |
| Databáze: | OpenAIRE |
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