| Autor: |
Ki-Woong Whang, Tae-Ho Lee, Sven Ole Steinmüller, Hee-Woon Cheong, Jürgen Janek |
| Rok vydání: |
2011 |
| Předmět: |
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| Zdroj: |
SID Symposium Digest of Technical Papers. 42:505-507 |
| ISSN: |
0097-966X |
| DOI: |
10.1889/1.3621368 |
| Popis: |
In this paper, it will be shown that we can reduce the driving voltage and improve the luminance and luminous efficacy of Plasma Display Panel(PDP) significantly by blocking the diffusion of impurities into the cathode layer which occurs during the high temperature process like panel assembly. The TOF-SIMS(Time-of-Flight Secondary Ion Mass Spectrometry) results show that the diffusion of impurities like Al, Na and K into the cathode layer can be effectively prevented by the adoption of a blocking layer made of SiO2. Another beneficial effect is the significant reduction of the aging time. It has been confirmed through the panel experiment that the impurity diffusion barrier is effective in reducing the voltage, aging time and increasing the luminous efficacy for both of the PDPs with a single MgO and a SrO-MgO double cathode layer with more spectacular improvements in the latter case. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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