The use of negative ions to enhance beam currents at low energies in an MeV ion implanter
| Autor: | John P. O'Connor, Nobuhiro Tokoro, Michael E. Mack, Anthony Renau |
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| Rok vydání: | 1991 |
| Předmět: | |
| Zdroj: | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 55:207-210 |
| ISSN: | 0168-583X |
| DOI: | 10.1016/0168-583x(91)96163-f |
| Popis: | Since the introduction of the G1500 ion implanter, the use of tandem accelerators in production ion implantation systems has become well established. However, the beam currents which are attainable at present at low energies ( |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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