Atomic Layer Epitaxy of Tungsten and Boron for Multilayer X-ray Optics

Autor: J.K. Shurtleff, J. Phillips, D.D. Allred, R.T. Perkins, L.V. Knight, J.M. Thorne
Rok vydání: 1992
Zdroj: Physics of X-Ray Multilayer Structures.
DOI: 10.1364/pxrayms.1992.pd1
Popis: The demand for high quality multilayer x-ray optics (MXOs) has increased as x-ray imaging applications have developed. MXOs must be uniform and smooth with precise periods. The period of the MXO determines the angle and wavelength of the x-ray which can be reflected. Current preparation techniques are limited to a period of approximately 40 Å. To reflect harder x-rays at near normal incidence, smaller periods must be achieved.
Databáze: OpenAIRE