X‐ray photoelectron spectroscopy characterization of the oxidation and reduction of polycrystalline ZrPt3 and HfIr3 from 300 to 1700 K

Autor:	M. D. Alvey, R. F. Fisher, P. M. George
Rok vydání:	1992
Předmět:	Materials science Passivation Hydrogen Inorganic chemistry Oxide Intermetallic chemistry.chemical_element Surfaces and Interfaces Condensed Matter Physics Oxygen Redox Surfaces Coatings and Films chemistry.chemical_compound chemistry X-ray photoelectron spectroscopy Oxidizing agent
Zdroj:	Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 10:2253-2260
ISSN:	1520-8559 0734-2101
DOI:	10.1116/1.577927
Popis:	Samples of the Engel–Brewer intermetallic compounds ZrPt3 and HfIr3 are characterized by x‐ray photoelectron spectroscopy (XPS) after in vacuo exposure to oxygen, water vapor, and hydrogen at temperatures ranging from 300 to 1700 K. Results from these experiments indicate that both ZrPt3 and HfIr3 only partially react with oxygen and water vapor up to 1700 K, forming a surface oxide layer no thicker than approximately 35 A. The surface nature of the oxide layer is confirmed by angle‐resolved XPS studies on HfIr3. Vacuum annealing and hydrogen dosing prior to oxidation passivate the surface, inhibiting oxidation, while hydrogen exposure after oxidation reduces the surface oxide. Consequently, as a result of their stability in a high‐temperature oxidizing environment, these materials show promise for use as oxidation‐resistant coatings for high‐temperature carbon–carbon composite applications.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::4c85b1937d9bbd6763eeb17057bcde2e https://doi.org/10.1116/1.577927 Zobrazit plný text záznamu