Effects of Nitrogen Dilution on the Photoresist Removal Rate by Hydrogen Radicals

Autor:	Shiro Nagaoka, Masashi Yamamoto, Koki Akita, Hiroto Nishioka, Hironobu Umemoto, Hideo Horibe
Rok vydání:	2020
Předmět:	Materials science Polymers and Plastics Hydrogen radical Organic Chemistry Inorganic chemistry Materials Chemistry Nitrogen dilution Photoresist
Zdroj:	Journal of Photopolymer Science and Technology. 33:427-431
ISSN:	1349-6336 0914-9244
DOI:	10.2494/photopolymer.33.427
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::4c4ad04a8866b181cf297e9d85b3fd9e https://doi.org/10.2494/photopolymer.33.427 Zobrazit plný text záznamu