Laser-driven high-resolution patterning of indium tin oxide thin film for electronic device
| Autor: | Myeongkyu Lee, Hyunkwon Shin, Boyeon Sim |
|---|---|
| Rok vydání: | 2010 |
| Předmět: |
Materials science
business.industry Mechanical Engineering Photoresist Isotropic etching Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials Indium tin oxide Pentacene chemistry.chemical_compound chemistry Thin-film transistor Optoelectronics Electrical and Electronic Engineering Thin film business Layer (electronics) Transparent conducting film |
| Zdroj: | Optics and Lasers in Engineering. 48:816-820 |
| ISSN: | 0143-8166 |
| DOI: | 10.1016/j.optlaseng.2010.02.008 |
| Popis: | We here introduce a laser-driven process to pattern transparent thin films on transparent substrates. This method utilizes a pre-patterned metal film as the dynamic release layer and the transparent thin film is selectively removed by a thermo-elastic force laser-induced in the underlying metal layer. High-fidelity indium tin oxide (ITO) thin film patterns were fabricated on plastic and glass substrates using a pulsed Nd:YAG laser. Tens of square centimeters could be patterned with several pulse shots. We fabricated a pentacene thin film transistor with ITO source and drain electrodes and observed a very low off-current level. This tells that the channel area between ITO electrodes was completely etched out by this laser-driven process. Combined with the absence of photoresist and chemical etching steps, this method provides a simple high-resolution route to pattern transparent thin films over large areas at low temperatures. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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