Photo-stability of a-Si solar cells fabricated by 'Liquid-Si printing method' and treated with catalytic generated atomic hydrogen
| Autor: | Tatsuya Shimoda, Keisuke Ohdaira, Hiroko Murayama, Takashi Masuda, Tatsushi Ohyama, Isao Yoshida, Akira Terakawa |
|---|---|
| Rok vydání: | 2015 |
| Předmět: |
Amorphous silicon
Materials science Hydrogen Photoconductivity Metals and Alloys Analytical chemistry chemistry.chemical_element Nanotechnology Surfaces and Interfaces Chemical vapor deposition Surfaces Coatings and Films Electronic Optical and Magnetic Materials Catalysis law.invention chemistry.chemical_compound Solar cell efficiency chemistry law Solar cell Materials Chemistry Characteristic energy |
| Zdroj: | Thin Solid Films. 575:100-102 |
| ISSN: | 0040-6090 |
| Popis: | The film properties and solar cell performances of hydrogenated amorphous silicon (a-Si:H) fabricated by a newly developed non-vacuum process “Liquid-Si printing method” were systematically investigated by comparing to the conventional plasma-chemical vapor deposition method. The as-printed a-Si:H films showed relatively high Urbach-tail characteristic energy (E ch ), high [Si–H 2 ]/[Si–H], and low photoconductivity (~ 10 − 7 S/cm). However, the [Si–H 2 ]/[Si–H] decreased, and the photoconductivity was improved to the device grade level (~ 10 − 5 S/cm) after appropriate catalytic-generated atomic hydrogen treatment. It was also found that the light-induced degradation of the photoconductivity and solar cell efficiency of the printed samples were less than half of the conventional a-Si:H case. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect