Vapour phase formation of amino functionalised Si3N4 surfaces
| Autor: | Kevin Critchley, Stephen D. Evans, Jon A. Preece, Christopher A. E. Hamlett, Philip D. Prewett, M Ł Górzny |
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| Rok vydání: | 2008 |
| Předmět: |
Silanes
Analytical chemistry Self-assembled monolayer Surfaces and Interfaces Chemical vapor deposition Condensed Matter Physics Surfaces Coatings and Films Contact angle chemistry.chemical_compound X-ray photoelectron spectroscopy chemistry Chemical engineering Silicon nitride Phase (matter) Monolayer Materials Chemistry |
| Zdroj: | Surface Science. 602:2724-2733 |
| ISSN: | 0039-6028 |
| DOI: | 10.1016/j.susc.2008.06.026 |
| Popis: | Self-assembled monolayer (SAM) formation of silanes on SiO 2 surfaces has been extensively studied. However, SAMs formed on silicon nitride (Si 3 N 4 ) substrates have not been explored to the same level as SiO 2 , even though they are of technological interest with a view to the chemical modification of microelectromechanical systems (MEMS). Therefore, this article presents the formation and characterisation of 3-aminopropyltrimethoxysilane (APTMS) SAMs on Si 3 N 4 substrates from solution phase and vapour phase, compared to the well characterised APTMS SAMs formed on SiO 2 surfaces. Contact angle, atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and ellipsometric data indicate the formation of APTMS SAMs (0.55 nm ellipsometric thickness) after 60 min immersion of either SiO 2 or Si 3 N 4 substrates in APTMS solution (0.5 mM in EtOH). By comparison Si 3 N 4 substrates exposed to APTMS vapour, at 168 mbar for 60 min, result in the formation of the equivalent of a bi or trilayer of APTMS. |
| Databáze: | OpenAIRE |
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