Laser chemical vapor deposition of copper
| Autor: | Caroline A. Kovac, C. Pico, Frances A. Houle, Carol R. Jones, Thomas H. Baum |
|---|---|
| Rok vydání: | 1985 |
| Předmět: |
Materials science
Physics and Astronomy (miscellaneous) chemistry Hybrid physical-chemical vapor deposition Inorganic chemistry Ion plating chemistry.chemical_element Chemical vapor deposition Combustion chemical vapor deposition Thin film Copper Electron beam physical vapor deposition Pulsed laser deposition |
| Zdroj: | Applied Physics Letters. 46:204-206 |
| ISSN: | 1077-3118 0003-6951 |
| DOI: | 10.1063/1.95685 |
| Popis: | The first laser‐induced deposition of copper has been demonstrated using a volatile copper coordination complex. The technique is characterized by reasonable rates and by the high quality of copper produced. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|