EFFECTS OF PLASMA PARAMETERS ON PASSIVATION OF POLYCRYSTALLINE SILICON IN INDUCTIVE LOW PRESSURE HYDROGEN PLASMA

Autor:	S. Awamat, Daniel Morvan, S. Darwiche, Dominique Ballutaud, Jacques Amouroux, M. Nikravech
Rok vydání:	2007
Předmět:	Materials science Polycrystalline silicon Passivation Plasma parameters Analytical chemistry engineering General Medicine Plasma engineering.material
Zdroj:	High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes). 11:297-308
ISSN:	1093-3611
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::4b2b33acd388e0d62223127cfdfe036f https://doi.org/10.1615/hightempmatproc.v11.i2.120 Zobrazit plný text záznamu