| Autor: |
Lin Zhang, D.C. Hanna, Anne C. Tropper, P.J. Chandler, S.J. Field, David Shepherd, A.C. Large, P.D. Townsend |
| Rok vydání: |
1992 |
| Předmět: |
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| Zdroj: |
Integrated Photonics Research. |
| Popis: |
Ion implantation is a technique which can be used to form waveguides in a wide range of materials - including crystals of the garnet family for which no alternative techniques exist - by bombarding the material surface with high energy ions and altering the refractive index [1]. We report the use of this method to form channel waveguides in two Nd3+ doped materials; Nd:YAG and Nd:GGG both of which have operated as ion implanted planar waveguide lasers [2,3]. The additional confinement in the plane is achieved without any significant increase in propagation losses, which are comparable in the planar and channel guides. In the Nd:YAG system submilliwatt thresholds were observed. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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