Formation of negative ions by electron impact on SiF4 and CF4

Autor:	M. V. V. S. Rao, I. Iga, J. C. Nogueira, S. K. Srivastava
Rok vydání:	1992
Předmět:	Materials science Ionization Electron attachment Thermochemistry Polar Plasma Atomic physics Atomic and Molecular Physics and Optics Dissociation (chemistry) Electron ionization Ion
Zdroj:	Zeitschrift f�r Physik D Atoms, Molecules and Clusters. 24:111-115
ISSN:	1434-6079 0178-7683
DOI:	10.1007/bf01426694
Popis:	First measurements of cross sections for the formation of negative ions by electron attachment to SiF4 and CF4 are reported for an electron impact energy range of 0 to 50 eV. The energies at which the various ions appear and the positions at which the ionization efficiency curves peak have been obtained and compared with previous measurements. Thermochemical data have been used to predict and identify the various channels of dissociation. Cross sections for the production of ion pairs through the process of polar dissociation have also been measured.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::4ac9e3a4c983412b0bd4b61d889bf629 https://doi.org/10.1007/bf01426694 Zobrazit plný text záznamu Full text from SpringerLink