Coatings and microstructures of monolithic TiB2 films and double layer and composite TiCN/TiB2 films from alkoxide solutions by thermal plasma CVD
| Autor: | Jiro Tsujino, Hajime Kiyono, Masayuki Takahashi, Shiro Shimada |
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| Rok vydání: | 2008 |
| Předmět: |
Materials science
Composite number Metals and Alloys chemistry.chemical_element Surfaces and Interfaces Chemical vapor deposition Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry.chemical_compound Carbon film X-ray photoelectron spectroscopy chemistry Plasma-enhanced chemical vapor deposition Alkoxide Materials Chemistry Composite material Boron Titanium |
| Zdroj: | Thin Solid Films. 516:6616-6621 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2007.11.093 |
| Popis: | Monolithic TiB 2 films and double layer and composite TiCN–TiB 2 films were deposited on Si wafers from a mixture of titanium tetra-ethoxide and boron tri-ethoxide solutions at a 1:2 mole ratio at 800 °C for 20 min by chemical vapor deposition in a thermal N 2 /H 2 plasma. The TiB 2 films were deposited without N 2 , while the double layer and composite TiCN–TiB 2 films of various compositions were deposited by varying N 2 flow rates in N 2 /H 2 plasma. The surfaces and cross-sections of the films were observed by SEM, exhibiting the microstructures and thickness of the films. The relative atomic percentages of Ti, N, B, bonded and free C, and O in the films were determined semi-quantitatively from their XPS peak areas. Microstructures of the composite films with the composition 3TiC 0.5 N 0.5 /2TiB 2 formed at N 2 = 50 mL min − 1 were observed by TEM, revealing the sizes and orientations of the particles with the distribution of Ti and B elements in the film. |
| Databáze: | OpenAIRE |
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