Modeling the thickness distribution of silicon oxide thin films grown by reactive magnetron sputtering

Autor:	J. Cruz, R. Sanginés, J Aguila-Muñoz, R. Machorro-Mejía, Stephen Muhl, N Abundiz-Cisneros
Rok vydání:	2019
Předmět:	Reactive magnetron Materials science Acoustics and Ultrasonics Distribution (number theory) business.industry Sputtering Optoelectronics Thin film Condensed Matter Physics business Silicon oxide Surfaces Coatings and Films Electronic Optical and Magnetic Materials
Zdroj:	Journal of Physics D: Applied Physics. 52:495201
ISSN:	1361-6463 0022-3727
DOI:	10.1088/1361-6463/ab3e9e
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::4a45f244f4e00c18c9e8828916ac5e9b https://doi.org/10.1088/1361-6463/ab3e9e Zobrazit plný text záznamu