Role of solvents in chemical vapor deposition: implications for copper thin-film growth

Autor:	Chao Ming Chiang, Timothy M. Miller, Lawrence H. Dubois
Rok vydání:	1993
Předmět:	Aqueous solution Chemistry Inorganic chemistry General Engineering Infrared spectroscopy chemistry.chemical_element Isopropyl alcohol Chemical vapor deposition Copper chemistry.chemical_compound Methanol Physical and Theoretical Chemistry Thin film Tetrahydrofuran
Zdroj:	The Journal of Physical Chemistry. 97:11781-11786
ISSN:	1541-5740 0022-3654
DOI:	10.1021/j100147a035
Popis:	Recent studies have shown that the rate of copper film growth from the chemical vapor deposition (CVD) of solid Cu(II) β-diketonates is enhanced in the presence of selected solvents. To shed light on the role of solvents in CVD processes, the vapor-phase, solution, and surface chemistries of bis(hexafluoroacetylacetonate)copper-(II) (Cu(hfac) 2 ) and (hexafluoroacetylacetonate)(trimethylphosphine)copper(I) (Cu(hfac)(PMe 3 )) dissolved in alcohol (methanol, ethanol, isopropyl alcohol), acetone, tetrahydrofuran, toluene, and water were studied by molecular beam/mass spectrometry, nuclear magnetic resonance, and reflection-absorption infrared spectroscopies. We found that alcohols and water reversibly coordinate to Cu(hfac) 2 to form alcoholates and hydrates, respectively
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::4a07bd824a143ee9f568ae93209ae89d https://doi.org/10.1021/j100147a035 Zobrazit plný text záznamu