Plasma functionalization of silicon carbide crystalline nanoparticles in a novel low pressure powder reactor
| Autor: | Jean-Jacques Pireaux, Patrick Choquet, Maryline Moreno-Couranjou, Hubert Hody |
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| Rok vydání: | 2010 |
| Předmět: |
Materials science
Analytical chemistry Nanoparticle chemistry.chemical_element Surfaces and Interfaces General Chemistry Chemical vapor deposition engineering.material Condensed Matter Physics Oxygen Surfaces Coatings and Films chemistry.chemical_compound Coating chemistry Chemical engineering X-ray photoelectron spectroscopy Transmission electron microscopy Materials Chemistry engineering Silicon carbide Surface modification |
| Zdroj: | Surface and Coatings Technology. 205:22-29 |
| ISSN: | 0257-8972 |
| DOI: | 10.1016/j.surfcoat.2010.05.045 |
| Popis: | In order to functionalize silicon carbide nanopowders with carboxylic groups, an r.f. (13.56 MHz) low pressure plasma reactor has been developed so that particles can be stirred during the processing to try to coat them on their whole surface. Coatings in an O 2 /hexamethyldisilazane (HMDSN) mixture have first been optimized on flat substrates; X-ray Photoelectron Spectroscopy (XPS) analysis showed that the O 2 /HMDSN gas mixture resulted in a coating evolving from a polymer-like structure to a more inorganic SiO x -like structure as the oxygen ratio increased. For a large O 2 /HMDSN value, carboxylic groups were detected on the sample surface. Silicon carbide nanoparticles have then been plasma processed in such a reactive atmosphere. XPS, Time of Flight Secondary Ion Mass Spectroscopy (ToF-SIMS) and Transmission Electron Microscopy (TEM) analyses evidenced the surface modification of the processed powder and confirmed the grafting of carboxylic groups. |
| Databáze: | OpenAIRE |
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