Volatile Etch Species Produced during Thermal Al2O3 Atomic Layer Etching
| Autor: | Steven M. George, Joel W. Clancey, Andrew S. Cavanagh, Sandeep Sharma, James E. T. Smith |
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| Rok vydání: | 2019 |
| Předmět: |
Imagination
Thesaurus (information retrieval) Chemical substance Materials science business.industry media_common.quotation_subject 02 engineering and technology 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences 0104 chemical sciences Surfaces Coatings and Films Electronic Optical and Magnetic Materials General Energy Etching (microfabrication) Thermal Optoelectronics Physical and Theoretical Chemistry 0210 nano-technology Science technology and society business Layer (electronics) media_common |
| Zdroj: | The Journal of Physical Chemistry C. 124:287-299 |
| ISSN: | 1932-7455 1932-7447 |
| Popis: | The thermal atomic layer etching (ALE) of Al2O3 can be achieved using sequential fluorination and ligand-exchange reactions. Although previous investigations have characterized the etch rates and s... |
| Databáze: | OpenAIRE |
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