Ion plasma sputtering as a method of introducing solid material into an electron cyclotron resonance ion source
Autor: | P.J. Billquist, R. Harkewicz, Jerry Nolen, R. C. Pardo, John P. Greene |
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Rok vydání: | 1995 |
Předmět: |
Materials science
Ion beam equipment and supplies Ion gun Fourier transform ion cyclotron resonance Electron cyclotron resonance Ion source Secondary ion mass spectrometry Condensed Matter::Materials Science Ion beam deposition Physics::Plasma Physics Physics::Accelerator Physics Atomic physics Instrumentation Ion cyclotron resonance |
Zdroj: | Review of Scientific Instruments. 66:2883-2887 |
ISSN: | 1089-7623 0034-6748 |
DOI: | 10.1063/1.1146501 |
Popis: | A direct ion plasma sputtering effect has been observed in an electron cyclotron resonance ion source and developed into a reliable and simple method for producing ion beams from some solid materials. We describe the ion sputtering technique used with the Argonne Tandem Linac Accelerator System Positive Ion Injector Electron Cyclotron Resonance ion source to produce, to date, stable beams of nickel, silver, tellurium, gold, lead, and bismuth and present the results obtained in test cases. |
Databáze: | OpenAIRE |
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