Stress, hydration, and optical absorption in ion-implanted aluminum oxide

Autor:	G.W. Arnold
Rok vydání:	1998
Předmět:	Aluminium oxides Materials science Absorption spectroscopy Mechanical Engineering Surface stress Analytical chemistry Mineralogy Condensed Matter Physics Ion Adsorption Ion implantation Mechanics of Materials General Materials Science Saturation (chemistry) Aluminum oxide
Zdroj:	Materials Science and Engineering: A. 253:71-77
ISSN:	0921-5093
DOI:	10.1016/s0921-5093(98)00711-4
Popis:	The surface stress induced by energetic implants (Ar, Xe) promotes ambient hydration (max.∼1 at.%) into Al 2 O 3 for collisional deposition energies of 10 21 –10 22 keV cm −3 . Al implants are anomalous in that they induce hydration above 10 21 keV cm −3 that rises near-linearly with no saturation at the highest deposition levels (∼10 24 keV cm −3 ). Both Al and H produce anomalously large F-centre concentrations; stress measurements show near-coincidence behaviour reflecting their influence on O-vacancy production.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::475e0a540f7f2474c58822d8e9d5c6f0 https://doi.org/10.1016/s0921-5093(98)00711-4 Zobrazit plný text záznamu Full Text from ScienceDirect