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Monocrystalline silicon has been considered for years among the materials at the base of the macro and micro-electronics industry. At the bulk state silicon is an intrinsic semiconductor whose conductive properties can be easily modulated by using doping agents. This feature combined with high availability and accessible production costs makes it particularly suitable for many applications based on semiconductor technology. With the development of vacuum deposition techniques, it has been possible to create systems that integrate monocrystalline silicon with other materials of technological interest, thus allowing the realization of highly performing devices. However, the use of these techniques is limited by special working conditions and very expensive instruments. An alternative to these techniques is the electrodeposition from aqueous solution. Studies on the deposition of materials of technological interest on gold and silver have been known for several years now. In this work we use the electrodeposition technique, with all the advantages it brings both in terms of costs and deposition quality, on monocrystalline 100 n-type silicon. The study dealt with the co-deposition and alternate deposition of the semiconductor cadmium selenide (CdSe) [1]. First of all, we carried out the electrochemical characterization of the precursors on the substrate to find the optimal conditions (pH and concentrations) for the deposition, then the deposition was performed using two different approaches: co-deposition (both the precursors present in the same solution) and charge controlled alternate deposition of the two components. Finally, deposits were characterized spectroscopically and microscopically: we found that, with the electrochemical method, we obtained to the formation of micro-clusters of CdSe on n-Si. The present study funded by the PRIN Project (“Progetti di Ricerca di Rilevante Interesse Nazionale”), “Novel Multilayered and Micro-Machined Electrode Nano-Architectures for Electrocatalytic Applications (Fuel Cells and Electrolyzers)”, grant number 2017YH9MRK. References: [1] Giurlani, W. et al. Electrodeposition of Nanoparticles and Continuous Film of CdSe on n-Si (100). Nanomaterials 9, 1504 (2019). 10.3390/nano9101504. |
