Chemical modification of sputtered amorphous-carbon surfaces

Autor:	William H. Johnston, George W. Tyndall, Pieter B. Leezenberg
Rok vydání:	2001
Předmět:	Materials science Hydrogen Analytical chemistry General Physics and Astronomy Chemical modification chemistry.chemical_element Sputter deposition Surface energy Carbon film chemistry Amorphous carbon Chemical engineering Thin film Carbon
Zdroj:	Journal of Applied Physics. 89:3498-3507
ISSN:	1089-7550 0021-8979
DOI:	10.1063/1.1338989
Popis:	Methods to chemically passivate the surfaces of amorphous-carbon films (a-C) produced by dc magnetron sputtering were studied. The chemical composition of carbon surfaces produced via sputtering are dependent upon the environment to which the carbon is exposed immediately following deposition. When the sputtered film is vented to ambient conditions, free radicals produced at the surface during the deposition process are quenched by reaction with oxygen and/or water to form an oxidized, hydrophilic surface. If the sputtered carbon film is, however, exposed to a reactive gas prior to venting to ambient, the chemical nature of the resulting surface can be modified substantially. Specifically, a less highly oxidized and much more hydrophobic carbon surface is produced when the surface free radicals are quenched via either an addition reaction (demonstrated with a fluorinated olefin) or a hydrogen abstraction reaction (demonstrated with two alkyl amines). Chemical modification of amorphous-carbon films can als...
Databáze:	OpenAIRE
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