Optimized Design of Transmission Grating Used for 13.4 nm Soft X-Ray Interference Lithography

Autor:	朱伟忠 Zhu Weizhong, 邰仁忠 Tai Renzhong, 吴衍青 Wu Yanqing, 陈敏 Chen Min, 徐洪杰 Xu Hongjie, 王纳秀 Wang Naxiu
Rok vydání:	2008
Předmět:	Soft x ray Optics Materials science business.industry business Diffraction grating Atomic and Molecular Physics and Optics Next-generation lithography Electronic Optical and Magnetic Materials Interference lithography
Zdroj:	Acta Optica Sinica. 28:1225-1230
ISSN:	0253-2239
DOI:	10.3788/aos20082807.1225
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::468480584c734b34797596299dc9fb90 https://doi.org/10.3788/aos20082807.1225 Zobrazit plný text záznamu