A Role of Rapid Thermal Annealing (RTA) for Achieving Fine Isolated Grains of FeCuPt

Autor:	Arata Tsukamoto, A. Itoh, K. Mizusawa, S. Okame
Rok vydání:	2012
Předmět:	Maximum temperature Materials science Si substrate Annealing (metallurgy) Slow cooling Analytical chemistry Electrical and Electronic Engineering Rapid thermal annealing Condensed Matter Physics Grain density Instrumentation Electronic Optical and Magnetic Materials Diffractometer
Zdroj:	Journal of the Magnetics Society of Japan. 36:62-65
ISSN:	1882-2932 1882-2924
DOI:	10.3379/msjmag.1108m004
Popis:	We already reported1), 2) that the rapid thermal annealing (RTA) of Fe/Pt and Fe/Cu/Pt multilayered continuous films are effective to obtain perpendicularly magnetized small L10-FePt grains on thermally oxidized Si substrate, and also the SiO2 substrates having self-organized nano-pores is able to increase the grain density significantly. However, relations between the process for forming isolated grains from the continuous film and the annealing temperature are not clarified. Then, we fabricate FeCuPt by RTA, under the variety of heating up rate (TR) and the maximum temperature (Tm). Isolated grains are obtained at higher TR and Tm, however at higher Tm than approximately 550°C, large grains have been appeared. We introduce a rapid cooling process into RTA and comparing the results with the both cases of rapid and slow cooling processes to clarify at what temperature the isolation of grains has been occurred. With the rapid cooling process, a new peaks in XRD (Xray diffractometer) profile which correspond to the disordered structure of FeCuPt are appeared.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::461efd8ee55b81585675697095ac7a3f https://doi.org/10.3379/msjmag.1108m004 Zobrazit plný text záznamu