Measurement of side walls of high aspect ratio microstructures
| Autor: | M. Simon, E. Reznikova, V. Nazmov, A. Last |
|---|---|
| Rok vydání: | 2008 |
| Předmět: |
chemistry.chemical_classification
Fabrication Materials science business.industry Polymer Condensed Matter Physics Microstructure Electronic Optical and Magnetic Materials law.invention Digital image Optics Planar chemistry Optical microscope Hardware and Architecture law Hardening (metallurgy) Electrical and Electronic Engineering business Lithography |
| Zdroj: | Microsystem Technologies. 14:1727-1729 |
| ISSN: | 1432-1858 0946-7076 |
| Popis: | In this paper, the new method of measurements is presented for the technological control of the lithographic fabrication of high aspect ratio microstructures with complex side-wall profiles. The sampling procedure includes pouring polymer glue on a substrate with the microstructures and its hardening, sectioning the polymer matrix in the depth with planes parallel to the substrate and analysis of digital optical microscope images of the planes. The measured deviations the micro structure profiles in comparison with the designed geometry are used for the further optimization of the technological design of planar X-ray refractive lenses. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full text from SpringerLink