Functionalization of low-k surfaces with low-energy Ar ions
| Autor: | null Voronina E. N., null Sycheva A. A., null Solovykh A. A. |
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| Rok vydání: | 2022 |
| Zdroj: | Technical Physics Letters. 48:15 |
| ISSN: | 1726-7471 |
| Popis: | In this work low-energy Ar impacts on low- k surfaces were simulated with ab initio density functional theory method. The obtained results reveal the mechanism of CH3-group removal under Ar atom/ion irradiation; the threshold energy of this process was estimated. Keywords: low-k dielectrics, functionalization, simulation, diffusion barriers, methyl groups. |
| Databáze: | OpenAIRE |
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