Functionalization of low-k surfaces with low-energy Ar ions

Autor: null Voronina E. N., null Sycheva A. A., null Solovykh A. A.
Rok vydání: 2022
Zdroj: Technical Physics Letters. 48:15
ISSN: 1726-7471
Popis: In this work low-energy Ar impacts on low- k surfaces were simulated with ab initio density functional theory method. The obtained results reveal the mechanism of CH3-group removal under Ar atom/ion irradiation; the threshold energy of this process was estimated. Keywords: low-k dielectrics, functionalization, simulation, diffusion barriers, methyl groups.
Databáze: OpenAIRE