| Popis: |
Silicon with various structural morphologies is widely used for solar cells and other optoelectronic devices. We present a new chemical etching process for nanoscale texturing of Si surfaces, which results in an almost complete suppression of the reflectivity in a broad spectral range, leading to black Si surfaces. The chemical etching process affects only the topmost 200-300 nm of the Si material. And it isn't dependent on the Si surface orientation and doping. Besides, the antireflective performance of reacted Si surface will highly improve with silver catalyst effect. Hence, it can be applied to various structural forms of bulk silicon as well as to thin Si films. The optical properties of various black Si samples are presented and discussed in correlation with the surface morphology, which are measured by atomic force microscope. |
