Polycycloalkanes as Potential Third-Generation Immersion Fluids for Photolithography at 193 nm

Autor:	Nicholas J. Turro, Paul M. Zimmerman, Will Conley, Bruce W. Smith, Juan López-Gejo, Joy T. Kunjappu, Jiawang Zhou
Rok vydání:	2007
Předmět:	Alkane chemistry.chemical_classification Chemistry law General Chemical Engineering Materials Chemistry Analytical chemistry Organic chemistry General Chemistry Photolithography Refractive index Third generation law.invention
Zdroj:	Chemistry of Materials. 19:3641-3647
ISSN:	1520-5002 0897-4756
Popis:	In a search for alkane candidates for 193 nm immersion fluids, several alkanes and cycloalkanes were synthesized, purified, and screened to ascertain their absorption at 193 nm, refractive index, a...
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::44be750ae9161f22cdd626aa5c1d3517 https://doi.org/10.1021/cm0701660 Zobrazit plný text záznamu