Polystyrene thin films treatment under DC pulsed discharge in nitrogen: effect of sample placement and glow duration on the wettability

Autor:	N. Soulem, Nicholas M. Spyrou, J. Larrieu, B. Held
Rok vydání:	2004
Předmět:	Chemistry Analytical chemistry Plasma Condensed Matter Physics Cathode Electronic Optical and Magnetic Materials Anode Afterglow law.invention chemistry.chemical_compound law Electrode Polystyrene Wetting Thin film Instrumentation
Zdroj:	The European Physical Journal Applied Physics. 29:181-188
ISSN:	1286-0050 1286-0042
DOI:	10.1051/epjap:2004192
Popis:	This paper is devoted to atactic polystyrene (aPS) thin films treatment under DC pulsed discharge in nitrogen. The experiments were performed using a symmetrical plane-to-plane of electrodes configuration in order to improve the treatment homogeneity and also to compare the treatment efficiency when the aPS is on the cathode or on the anode. During these experiments, the pressure and the electrical conditions were maintained unchanged. The experimental results were compared for the two positions of samples, when the gap length and the afterglow duration time were varied. It appears that the treatment depends on the sample position and an interpretation is proposed. The physical conditions and the reaction processes in the plasma bulk and on the aPS surface were analysed in order to understand their influence on the surface treatment. The importance of metastables is pointed out and it is deduced that these long-life excited states are firstly produced near the anode and fill the gap following the evolution and distribution of the electron current density.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::44a8fe7dc58a838b7ca59a359b66bc1b https://doi.org/10.1051/epjap:2004192 Zobrazit plný text záznamu