Lithography hotspot correction on post-OPC layout using generative adversarial networks
| Autor: | Weilun Ciou, Tony Hu, Fz Cheng, Yi-Yien Tsai, Chung-Te Hsuan, Elvis Yang, Ta-Hung Yang, Kuang-Chao Chen |
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| Rok vydání: | 2023 |
| Zdroj: | DTCO and Computational Patterning II. |
| DOI: | 10.1117/12.2654456 |
| Databáze: | OpenAIRE |
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