Negative Ion Formation In SiO/sub 2/ Etching Using A Pulsed ICP Plasma

Autor:	O Sung Kwon, Yeo Song Seol, Chang Ju Choi
Rok vydání:	1998
Předmět:	Materials science Distribution function Etching (microfabrication) Analytical chemistry Electron Radio frequency Atomic physics Reactive-ion etching Inductively coupled plasma Plasma density Ion
Zdroj:	Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135).
DOI:	10.1109/imnc.1998.730051
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::442e53da1f4036b852769f243f45c780 https://doi.org/10.1109/imnc.1998.730051 Zobrazit plný text záznamu