Reactive Magnetron Sputter Deposition of Titanium Oxynitride TiNxOy Coatings: Influence of Substrate Bias Voltage on the Structure, Composition, and Properties
| Autor: | S. Sali, L. Bait, A. Hammouche, Mourad Azibi, N. Madaoui, Nadia Saoula |
|---|---|
| Rok vydání: | 2019 |
| Předmět: |
Anatase
Materials science 020209 energy Organic Chemistry Metals and Alloys chemistry.chemical_element 02 engineering and technology Substrate (electronics) Sputter deposition 021001 nanoscience & nanotechnology Titanium nitride Surfaces Coatings and Films chemistry.chemical_compound chemistry Rutile 0202 electrical engineering electronic engineering information engineering Materials Chemistry Transmittance Composite material 0210 nano-technology Tin Titanium |
| Zdroj: | Protection of Metals and Physical Chemistry of Surfaces. 55:743-747 |
| ISSN: | 2070-206X 2070-2051 |
| DOI: | 10.1134/s207020511904018x |
| Popis: | TiOxNy films were grown onto 316L stainless steel substrate using radiofrequency (rf) magnetron sputtering from a pure titanium nitride target in Ar–O2 gas mixture with various substrate bias voltages. The aim of this work is to investigate the effect of applied substrate bias Vs, varied from 0 to –100 V, on the deposition rate, structure, hardness and optical properties of the TiNxOy films. The characterization of the coatings by grazing incidence X-ray diffraction exhibited a crystalline structure of a mixture of TiN, rutile and anatase. The indirect and direct bad gap were found to decrease for unbiased substrate voltage to Vs = −100 V from 3.84 to 3.20 eV. In addition, the coatings exhibit high transparency (transmittance over 80%). The hardness of the coatings were found in the range of 6.2 to 12.5GPa. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full text from SpringerLink