Static load-displacement behavior of PDMS microfeatures for soft lithography
| Autor: | Joseph Edward Petrzelka, David E. Hardt |
|---|---|
| Rok vydání: | 2012 |
| Předmět: |
Materials science
Polydimethylsiloxane Mechanical Engineering PDMS stamp Stiffness Mechanical engineering Nanotechnology Elastomer Finite element method Soft lithography Electronic Optical and Magnetic Materials chemistry.chemical_compound chemistry Mechanics of Materials medicine Electrical and Electronic Engineering Thin film medicine.symptom Buckle |
| Zdroj: | Journal of Micromechanics and Microengineering. 22:075015 |
| ISSN: | 1361-6439 0960-1317 |
| DOI: | 10.1088/0960-1317/22/7/075015 |
| Popis: | This paper develops a general model for the load-displacement behavior of polymer microfeatures, such as those encountered in polydimethylsiloxane (PDMS) stamps for soft lithography. Soft lithography is an attractive low-cost method of patterning surfaces via selective mechanical contact, often by printing a molecular monolayer or depositing thin films. The fidelity of the transferred pattern is dependent on successful mechanical contact, however, the soft elastomers used for stamps can often collapse or buckle under moderate pressures. This work seeks to complement the existing understanding of collapse pressure with an understanding of the complete load-displacement behavior of the stamp features. A model is developed for feature stiffness by examining an analytical solution in the limits of very large or very small feature aspect ratios and computing intermediate behavior through a large set of finite element simulations. This model is subsequently validated with experimental load-displacement data. Analytical models are used to predict particular modes of collapse, showing excellent agreement with experimental observations. |
| Databáze: | OpenAIRE |
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