Poly(dimethylsiloxane-b-methyl methacrylate): A Promising Candidate for Sub-10 nm Patterning
| Autor: | Weichao Shi, Damien Montarnal, Craig J. Hawker, Glenn H. Fredrickson, Yingdong Luo, Christian W. Pester, Edward J. Kramer, Matthew D. Christianson, Katherine P. Barteau, Phillip D. Hustad, Sangwon Kim |
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| Rok vydání: | 2015 |
| Předmět: | |
| Zdroj: | Macromolecules. 48:3422-3430 |
| ISSN: | 1520-5835 0024-9297 |
| Popis: | We report herein the modular synthesis and nanolithographic potential of poly(dimethylsiloxane-block-methyl methacrylate) (PDMS-b-PMMA) with self-assembled domains approaching sub-10 nm periods. A straightforward and modular coupling strategy, optimized for low molecular weight diblocks and using copper-catalyzed azide–alkyne “click” cycloaddition, was employed to obtain a library of PDMS-b-PMMA and poly(dimethylsiloxane-block-styrene) (PDMS-b-PS) diblock copolymers. Flory–Huggins interaction parameters, determined from small-angle X-ray scattering experiments, were high for PDMS-b-PMMA (χ ∼ 0.2 at 150 °C), suggesting this diblock copolymer system has promise for sub-10 nm lithographic applications when compared to the corresponding PDMS-b-PS diblock copolymers (χ ∼ 0.1 at 150 °C). Performance evaluation in thin film self-assembly experiments allowed domain periods as small as 12.1 nm to be obtained, which is among the smallest highly ordered nanoscale patterns reported hitherto for thermally annealed mat... |
| Databáze: | OpenAIRE |
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