Demonstrating production quality multiple exposure patterning aware routing for the 10NM node

Autor:	Mike Zhang, Geng Han, Brian Cline, Vassilios Gerousis, Lars W. Liebmann, Paul Gutwin
Rok vydání:	2014
Předmět:	Multiple exposure Computer science business.industry Node (networking) Hardware_INTEGRATEDCIRCUITS Multiple patterning Routing (electronic design automation) business Production quality Computer network
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
DOI:	10.1117/12.2045958
Popis:	This paper reviews the escalation in design constraints imposed on 2 nd level wiring by multiple patterning exposure techniques in the 10NM technology node (i.e. ~45nm wiring pitch) relative to the 14NM technology node (i.e. 64nm wiring pitch). Specifically, new challenges facing place-and-route tooling are outlined, solutions to overcome these challenges are reviewed, and a manufacturing ready implementation is demonstrated.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::43fc14c7138a778fd22a7cd507ba4c6e https://doi.org/10.1117/12.2045958 Zobrazit plný text záznamu