Rubidium beam flux dependence of film properties of Ba1−xRbxBiO3deposited by molecular‐beam epitaxy using distilled ozone

Autor:	Fumihiko Toda, Takehiko Makita, Mitsuhiko Ogihara, Hitoshi Abe
Rok vydání:	1993
Předmět:	chemistry Electrical resistivity and conductivity Transition temperature Inorganic chemistry Analytical chemistry General Physics and Astronomy chemistry.chemical_element Barium Thin film Epitaxy Stoichiometry Molecular beam epitaxy Rubidium
Zdroj:	Journal of Applied Physics. 74:5090-5095
ISSN:	1089-7550 0021-8979
Popis:	We have focused our attention on the dependence of Ba1−xRbxBiO3 (BRBO) film composition ratio and film properties on rubidium‐beam‐flux intensity. BRBO films were deposited on MgO(100) substrates by molecular‐beam epitaxy (MBE) using distilled ozone. Systematic measurements showed that the rubidium content was nearly independent of rubidium‐beam‐flux intensity in a wide beam‐flux range. Therefore, it can be concluded that some degree of self‐control of rubidium stoichiometry is actually possible in BRBO film growth by MBE. This study also revealed that the BRBO film properties had strong dependences on rubidium‐beam‐flux intensity even in the range for self‐control of rubudium stoichiometry. Our study also clarified that rubidium‐beam flux affects the barium content in the BRBO film.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::43cacb5cdeb9224b2eab0ea48cc36eba https://doi.org/10.1063/1.354294 Zobrazit plný text záznamu