Sensitivity Enhancement of Polyorganophosphazenes to Radiation with 2,2,4,4,6,6-Hexakis(2-Hydroxyethyl Methacrylate)Cyclotriphosphazene Monomer and its Application for Negative Resists
| Autor: | R. T. Chern, V. T. Stannett, R. W. Greer, G. L. Grune |
|---|---|
| Rok vydání: | 1994 |
| Předmět: |
chemistry.chemical_classification
Materials science Polymers and Plastics Scanning electron microscope General Chemistry Polymer Photoresist Methacrylate chemistry.chemical_compound Monomer chemistry Chemical engineering Resist Polymer chemistry Materials Chemistry Ceramics and Composites Electron-beam lithography Phosphazene |
| Zdroj: | Journal of Macromolecular Science, Part A. 31:1193-1206 |
| ISSN: | 1520-5738 1060-1325 |
| DOI: | 10.1080/10601329409351545 |
| Popis: | This work focuses on the application of a multifunctional phosphazene monomer, 2,2,4,4,6,6-hexakis(2-hydroxyethyl methacrylate)-cyclotriphosphazene (6-Hema) for enhancement of the sensitivity of polyphosphazenes to both 60Co and E-beam radiation. Specifically, elastomeric and glassy phosphazene polymer films treated with 6-Hema were irradiated under vacuum, and the gel content was determined. The Charlesby-Pinner approach was used to compare the radiation sensitivities of these films. This served as the basis for eventually preparing SiO2 wafers with thin films of the glassy polyphosphazenes mixed with or overcoated by the 6-Hema monomer. The SiO2 wafers prepared with the most sensitive polymer/monomer system were patterned with an ERC electron beam accelerator/scanning electron microscope computer-driven instrument. It was determined that these negative resist films were 1-2 orders of magnitude more sensitive to radiation than the polymers without the monomer. |
| Databáze: | OpenAIRE |
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