Aerial image based die-to-model inspections of advanced technology masks
| Autor: | Wei-Guo Lei, Joan McCall, Rajesh Nagpal, Jun Kim, Vivek Balasubramanian, Mark Wagner, Udy Danino, Suheil J. Zaatri, Michael Ben-Yishai, Lev Faivishevsky, Tejas H. Shah, Shmoolik Mangan, Michael Penn, Oded Dassa, Aviram Tam |
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| Rok vydání: | 2009 |
| Předmět: |
Automated optical inspection
Engineering drawing Engineering Transform theory business.industry ComputingMethodologies_IMAGEPROCESSINGANDCOMPUTERVISION Mask inspection Integrated circuit layout law.invention Automated X-ray inspection Resist law Computer vision Artificial intelligence Photolithography business Aerial image |
| Zdroj: | SPIE Proceedings. |
| ISSN: | 0277-786X |
| Popis: | Die-to-Model (D2M) inspection is an innovative approach to running inspection based on a mask design layout data. The D2M concept takes inspection from the traditional domain of mask pattern to the preferred domain of the wafer aerial image. To achieve this, D2M transforms the mask layout database into a resist plane aerial image, which in turn is compared to the aerial image of the mask, captured by the inspection optics. D2M detection algorithms work similarly to an Aerial D2D (die-to-die) inspection, but instead of comparing a die to another die it is compared to the aerial image model. D2M is used whenever D2D inspection is not practical (e.g., single die) or when a validation of mask conformity to design is needed, i.e., for printed pattern fidelity. D2M is of particular importance for inspection of logic single die masks, where no simplifying assumption of pattern periodicity may be done. The application can tailor the sensitivity to meet the needs at different locations, such as device area, scribe lines and periphery. In this paper we present first test results of the D2M mask inspection application at a mask shop. We describe the methodology of using D2M, and review the practical aspects of the D2M mask inspection. |
| Databáze: | OpenAIRE |
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