Isolated-grouped linewidth bias on SVGL Micrascan

Autor:	Alex Hong, Vasanti A. Deshpande, Karey L. Holland
Rok vydání:	1993
Předmět:	Materials science business.industry Image processing Data modeling Process conditions law.invention Metrology Laser linewidth Optics Resist law Photolithography business Aerial image
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
DOI:	10.1117/12.150437
Popis:	Isolated to grouped linewidth bias is an important factor in determining the capability of an exposure tool. The process latitude can be significantly improved by minimizing the bias for small geometries (0.5 micron and less). The data presented here optimizes process related performances of SVGL Micrascan I (0.5 micron) and Micrascan II (0.35 micron). The work takes into account different contributions to the overall linewidth bias using modeling of aerial images and resist profiles. Experimental results are presented for positive and negative resists on Micrascan I, and positive resist on Micrascan II. The bias for aerial image is predicted by a model. The post-develop bias depends on the process conditions and the resist system used. Optimized processes are used on Micrascan I and II, and data on different substrates are presented.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::4384e81b1c39ff222b5c0ec08b235881 https://doi.org/10.1117/12.150437 Zobrazit plný text záznamu