Study of the spatial resolution of laser thermochemical technology for recording diffraction microstructures
| Autor: | Vadim P. Veiko, A R Sametov, E. A. Shakhno, V I Korol'kov, Alexander G. Poleshchuk, M. V. Yarchuk |
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| Rok vydání: | 2011 |
| Předmět: |
Diffraction
Fabrication Laser ablation Materials science business.industry Statistical and Nonlinear Physics Laser Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials law.invention Optics law Etching (microfabrication) Electrical and Electronic Engineering Photomask Photolithography business Image resolution |
| Zdroj: | Quantum Electronics. 41:631-636 |
| ISSN: | 1468-4799 1063-7818 |
| DOI: | 10.1070/qe2011v041n07abeh014528 |
| Popis: | The thermochemical method for recording data, which is based on local laser oxidation of a thin metal film with subsequent etching of the unirradiated region, is an alternative to laser photolithography and direct laser removal of the film material. This recording technology is characterised by the absence of thermal and hydrodynamic image distortions, as in the case of laser ablation, and the number of necessary technological operations is much smaller as compared with the photomask preparation in classical photolithography. The main field of application of the thermochemical technology is the fabrication of diffraction optical elements (DOEs), which are widely used in printers, bar-code readers, CD and DVD laser players, etc. The purpose of this study is to increase the resolution of thermochemical data recording on thin chromium films. |
| Databáze: | OpenAIRE |
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