High extinction ratio polarization beam splitter with multimode interference coupler on SOI
| Autor: | Xingjun Wang, Weiwei Hu, Huaxiang Yi, Yawen Huang, Yanping Li, Zhao Tu |
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| Rok vydání: | 2013 |
| Předmět: |
Materials science
Plasma etching Extinction ratio business.industry Silicon on insulator Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials Transverse mode Wavelength Optics Extinction (optical mineralogy) Polarization beam splitter Electrical and Electronic Engineering Physical and Theoretical Chemistry business Lithography |
| Zdroj: | Optics Communications. 307:46-49 |
| ISSN: | 0030-4018 |
| DOI: | 10.1016/j.optcom.2013.05.055 |
| Popis: | A high extinction ratio polarization beam splitter based on multimode interference coupler has been obtained on silicon-on-insulator. The multimode interference coupler is designed by using quasi-state imaging theory, and fabricated with E-beam lithography and induced coupled plasma etching technology. The device has footprint of 8.16 μm×1034 μm. The measured extinction ratios remain 45 dB for TE mode and 23 dB for TM mode at wavelength of 1.55 μm. The extinction ratio of more than 20 dB for TE mode and 15 dB for TM mode is observed covering the whole C-band. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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