Periodic Fine Dimple Lines on the Surface of the Grain-Boundary Free Si Films Grown by Continuous-Wave-Laser Lateral Crystallization

Autor:	Nobuo Sasaki, Satoshi Takayama, Rikuto Sasai, Yukiharu Uraoka
Rok vydání:	2023
Zdroj:	2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM).
DOI:	10.1109/edtm55494.2023.10103033
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::432629de813a88bea492b3bcecbf6b5d https://doi.org/10.1109/edtm55494.2023.10103033 Zobrazit plný text záznamu