Ellipsometry study on silicon nitride film with uneven thickness distribution by plasma-enhanced chemical vapor deposition

Autor:	Zhiqin Zhong, Xiang Luo, Li Zhou, Sifu Hu, Liping Dai, Shuya Wang, Shaopeng Yang
Rok vydání:	2023
Předmět:	Electrical and Electronic Engineering Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials
Zdroj:	Optical and Quantum Electronics. 55
ISSN:	1572-817X 0306-8919
DOI:	10.1007/s11082-022-04270-x
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::429d9b6a5b04533bd6fd856850c83e1a https://doi.org/10.1007/s11082-022-04270-x Zobrazit plný text záznamu Full text from SpringerLink