Non-chemically Amplified Negative Molecular Resist Materials using Polarity Change by EUV Exposure

Autor:	Hiroyuki Maekawa, Hiroto Kudo, Kohei Fujisawa, Kazumasa Okamoto, Takahiro Kozawa
Rok vydání:	2021
Předmět:	Materials science Polymers and Plastics Resist Polarity (physics) Extreme ultraviolet lithography Extreme ultraviolet Organic Chemistry Materials Chemistry Photochemistry
Zdroj:	Journal of Photopolymer Science and Technology. 34:87-93
ISSN:	1349-6336 0914-9244
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::423ae47731d7704d776c498e9c1e2cd9 https://doi.org/10.2494/photopolymer.34.87 Zobrazit plný text záznamu