Experimental Investigation of ${C}$ – ${V}$ Characteristics of Si Tunnel FETs
Autor: | Chang Liu, Siegfried Mantl, Xi Wang, S. Glass, Keyvan Narimani, Wenjie Yu, A. Fox, A. T. Tiedemann, Qing-Tai Zhao, Qinghua Han, G. V. Luong |
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Rok vydání: | 2017 |
Předmět: |
010302 applied physics
Physics Silicon Condensed matter physics Analytical chemistry chemistry.chemical_element 02 engineering and technology 021001 nanoscience & nanotechnology 01 natural sciences Capacitance Electronic Optical and Magnetic Materials chemistry 0103 physical sciences Electrical and Electronic Engineering 0210 nano-technology Gate capacitance |
Zdroj: | IEEE Electron Device Letters. 38:818-821 |
ISSN: | 1558-0563 0741-3106 |
Popis: | This letter presents an experimental capacitance–voltage ${C}$ – ${V}$ analysis for Si p-tunnel FETs (TFETs) fabricated on ultrathin body at various frequencies and temperatures. The capacitance distribution in TFETs is quite different compared with MOSFETs, due to different inversion charges partitioning between source and drain. Contrary to predictions from simulations, we provide experimental evidence for the first time that the contribution of the gate-to-source capacitance ${C}_{\textsf {gs}}$ to the total gate capacitance is much larger than expected, and even comparable to the gate-to-drain capacitance ${C}_{\textsf {gd}}$ at higher ${V}_{\textsf {ds}}$ and ${V}_{g}$ . Comparable values of ${C}_{\textsf {gs}}$ and ${C}_{\textsf {gd}}$ would imply that the Miller capacitance effect in TFETs-based circuits is less pronounced as predicted in simulations. |
Databáze: | OpenAIRE |
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